Product
Introduction
Single Wet Processor
Single web processors are equipment that independently clean a single wafer in the semiconductor manufacturing process, reducing cross-contamination and enabling precise process control.
- 특성
- Minimize the risk of cross-contamination by processing on a single wafer basis.
- The process can be controlled independently for each wafer, resulting in consistent cleaning quality
- The precise cleaning process effectively removes contaminants from the wafer surface
- Different process conditions can be adjusted as required, which is advantageous when processing different types of wafers
- Optimized processes can be applied to individual wafers, increasing overall process efficiency
제품 상세 설명
Cleaning
Semiconductor cleaning is an important process for producing high quality semiconductor devices
by removing contaminants from the wafer surface and is performed at various stages of wafer fabrication.
It mainly removes contaminants such as particles, organics matters, metal ions and native oxide films,
and the cleaning process is divided into dry (using plasma or laser) and wet (using chemical solutions) methods.
Single Wet Processor
The CENOTE system is a SWP cleaning system using the multi-cup method, which allows simultaneous cleaning of both sides of the wafer,
preventing contamination of the backside of the wafer and eliminating the need for backside cleaning.
| Post Polish | Final Clean | |||
|---|---|---|---|---|
| Type 1 | Type 2 | Type 3 | ||
| Main Unit | Load | Wet in (Open Cassette) |
Dry in (FOUP) |
|
| Unload | Dry out (Open Cassette, FOUP) |
Dry out (FOUP) |
||
| Transfer Robot (Set) | 2 | 3 | 1 | |
| Vertical DIO3 Dip (Set) | 1 | 2 | - | |
| Vertical brush scrub (Set) | 1 | 2 | - | |
| Process Spin (Set) | 1 | 2 | 2 | |
| Sub Unit | dHF Chemical Unit | Separate Unit | Separate Unit | Built in |
| DIO3 Generator | Separate Unit | |||